Smearing method of metal and semiconductor composite

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tjgus6142
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Smearing method of metal and semiconductor composite

#1 Post by tjgus6142 » Fri Aug 02, 2024 3:21 am

Dear vasp users,

For the calculation of conductor and semiconductor composite, which smearing method should I use to optimize the geometry?

I want to construct ZnTe(semiconductor) on the Ti3C2(conductor) layer.

If I optimize a slab composed of above composite with ISMEAR=0, then I also have to optimize the Ti3C2 bulk structure with ISMEAR=0 before constructing the slab, although it is metallic material?

Thank you for the help.

Regards.

manuel_engel1
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Re: Smearing method of metal and semiconductor composite

#2 Post by manuel_engel1 » Fri Aug 02, 2024 8:28 am

Hi,

Thanks for posting on the VASP forum. The Gaussian smearing method (ISMEAR=0) is suitable for both metals and semiconductors/insulators. However, it does require a careful choice of SIGMA. When you perform geometry optimization on the individual materials, you can follow the recommendations on the ISMEAR wiki page.
Manuel
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tjgus6142
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Re: Smearing method of metal and semiconductor composite

#3 Post by tjgus6142 » Mon Aug 05, 2024 6:18 am

Thank you for the reply!

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